NEW SURPASS PVD SYSTEM
The new SURPASS200 PVD System has been designed and qualified for 200mm semiconductor production. The SURPASS200 allows for process transparency by integrating existing Endura® process chambers, including PVD, Sputter Etch, and Orient/Degas on to the new up-to-date system architecture. In addition, enhancements such as dual blade robots for front and back transfer chambers, automatic wafer positioning system, and new software are available. For customers, there is now another solution for capacity requirements without risking reliability, process, or productivity as compared to Endura mainframe. Semicat can provide both types of solutions, Refurbished PVD Endura® or New PVD SURPASS.
